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Vol. 32, No. 8(2), S&M2292

ISSN (print) 0914-4935
ISSN (online) 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials, Volume 17, Number 4 (2005)
Copyright(C) MYU K.K.
pp. 179-186
S&M596 Research Paper of Special Issue
Published: 2005

Characterization of Orientation-Dependent Etching Properties of Quartz: Application to 3-D Micromachining Simulation System [PDF]

Di Cheng, Kazuo Sato, Mitsuhiro Shikida, Atsushi Ono, Kenji Sato, Kazuo Asaumi and Yasuroh Iriye

(Received Ocober 1, 2004; Accepted March 17, 2005)

Keywords: anisotropic etching, orientation dependence, ammonium bifluoride, single-crystal alpha-quartz

Novel characterization results of anisotropic etching properties of single-crystal alpha- quartz for a number of orientations using a spherical specimen are reported. The dimen- sions of the specimen’s surface were measured before and after etching, and the changes were used to calculate the etching rates for a single etching operation for a number of orientations. The etching rates were high at the Z-axis, but not the highest. Low etching rates, sometimes close to zero, were measured for directions perpendicular to the Z-axis. We first report the etching rate distribution perpendicular to the Z-axis. The estimated etching rates further allow us to simulate complete three-dimensional etching for arbi- trarily oriented quartz wafers.

Corresponding author: Di Cheng


Cite this article
Di Cheng, Kazuo Sato, Mitsuhiro Shikida, Atsushi Ono, Kenji Sato, Kazuo Asaumi and Yasuroh Iriye, Characterization of Orientation-Dependent Etching Properties of Quartz: Application to 3-D Micromachining Simulation System, Sens. Mater., Vol. 17, No. 4, 2005, p. 179-186.



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