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Notice of retraction
Vol. 34, No. 8(3), S&M3042

Notice of retraction
Vol. 32, No. 8(2), S&M2292

Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials, Volume 31, Number 7(2) (2019)
Copyright(C) MYU K.K.
pp. 2291-2301
S&M1932 Research Paper of Special Issue
https://doi.org/10.18494/SAM.2019.2317
Published in advance: April 9, 2019
Published: July 19, 2019

Direct Formation of Solution-based Al2O3 on Epitaxial Graphene Surface for Sensor Applications [PDF]

Kwan-Soo Kim, Hirokazu Fukidome, and Maki Suemitsu

(Received January 31, 2019; Accepted February 25, 2019)

Keywords: epitaxial graphene, solution process, sensor, microwave annealing

We propose a method for fabricating high-performance epitaxial graphene field-effect transistors (EG-FETs), involving a microwave-annealing-treated solution-based Al2O3 (MWA-treated sol-Al2O3) layer as a gate dielectric. The MWA process substantially preserves the pristine properties of EG with minimal hole doping and strain induction. The MWA-treated sol-Al2O3 showed a surface roughness of ~0.33 nm, a dielectric constant of 7.5, and a leakage current of 8.7 × 10−6 A/cm2. The transconductance of the MWA-based EG-FET presents an enhanced field effect mobility by a factor of about 8 compared with the EG-FET with a natural oxide of Al.

Corresponding author: Kwan-Soo Kim


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Cite this article
Kwan-Soo Kim, Hirokazu Fukidome, and Maki Suemitsu, Direct Formation of Solution-based Al2O3 on Epitaxial Graphene Surface for Sensor Applications, Sens. Mater., Vol. 31, No. 7, 2019, p. 2291-2301.



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